Collagen + PDRN Hydrogel Mask

Features Clinically inspired ingredients, including Collagen and PDRN, are combined in a hydrogel mask designed to help skin feel hydrated, improve the appearance of elasticity, and support a more radiant-looking complexion. Anti-slip Grip Technology: Embossed hydrogel design helps maintain a secure, comfortable fit while keeping serum in contact with the skin for a smooth, refreshing feel.

After cleansing and toning, gently separate the mask into two halves. Remove the film from the top half and apply the patterned side down. Repeat with the bottom half. Leave on for 30-60 minutes, or until the mask turns translucent. Remove and massage in the remaining essence. Follow with your favorite moisturizer. Precautions: For external use only. If rash and/or irritation occurs, stop using and see your doctor. Store at room temperature away from high humidity. Keep unused patches in the pa

Water, Glycerin, Methylpropanediol, Cocos Nucifera (Coconut) Oil, Niacinamide, Chondrus Crispus Powder, 1, 2-Hexanediol, Ceratonia Siliqua (Carob) Gum, Betaine, Hydroxyacetophenone, Butylene Glycol, Glycereth-26, Xanthan Gum, Polyglyceryl-3 Methylglucose Distearate, Allantoin, Glucomannan, Panthenol, Polyacrylate-13, Cellulose Gum, Glyceryl Stearate, Potassium Chloride, Propanediol, Cyamopsis Tetragonoloba (Guar) Gum, Polyglyceryl-10 Laurate, Dextrin, Adenosine, Hydrogenated Polyisobutene, Ethylhexyl Olivate, Ethylhexylglycerin, Dipotassium Glycyrrhizate, Sodium DNA, Sodium Acrylates Copolymer, Polyglyceryl-4 Oleate, Ethylhexyl Palmitate, Sorbitan Isostearate, Theobroma Cacao (Cocoa) Extract, Hydrolyzed Collagen, C12-13 Alketh-9, Tocopherol, Palmitoyl Pentapeptide-4, Hydrolyzed Hyaluronic Acid. Rael is dedicated to maintaining the accuracy of the ingredient lists on this website. However, because ingredients are subject to change, Rael cannot guarantee that these lists are complete, up-to-date and/or error-free. For an accurate listing of ingredients in each product, please refer to your product packaging.